The Nexus IBD-O, manufactured by Veeco Instruments is equipped with two inductively coupled ion beam plasma sources. The second plasma source may be used for optional ion beam assisted deposition. In-situ spectral ellipsometry (NIR-UV) allows sub-nanometer process control during deposition. Ion-beam deposition is known to produce very dense and smooth layers in a stable process.
The UHV background vacuum pressure of 10 torr ensures clean layers.
All this is essential for XUV mirrors, where each deposited layer is limited to 1-5 nm thickness and tens to hundreds of layers are formed. Up to 8 inch substrates can be loaded using a load-lock system.